Photo resist developer

Ultra-T : Cleaning Equipment

Logo UtE

Ultra-T Equipment designs and manufactures a complete range of automatic and semi-automatic equipment used during the various steps of manufacture for cleaning, acidification, development of sensitive resins.
This equipment can be used for cleaning masks, Quartz, silicon wafers, glass lenses after polishing or before a metallisation deposit, etc …
These equipment can be set up with different options depending on specific applications such as :

  • Single and double side cleaning
  • High pressure nozzle, megasonic , Spray nozzle…
  • Ozone cleaning
  • Single and double side cleaning with Nylon and  PVA brushes
  • Dimension of substrates from 25 to 740mm depending on the system
  • Configuration and specific development made depending on manufacturing processes.

Peritest the Ultra-T representative for south Europe.